Atomic Layer Deposition

 In Finnish - Suomeksii

Recent Reviews on the ALD Technology

Riikka Puurunen, A Short History of Atomic Layer Deposition: Tuomo Suntola’s Atomic Layer Epitaxy, Chemical Vapor Deposition, Vol 20, Issue 10-11-12, Wiley Online Library

40 years of ALD in Finland - Photos, Stories, Exhibition by the Finnish Centre of Excellence in Atomic Layer Deposition


Most cited patents and publications on Atomic Layer Deposition (Atomic Layer Epitaxy)

(Most recent at the top)

  • US Patent 6,572,705, 2003, T Suntola, S Lindfors, Method and apparatus for growing thin films.
  • T Suntola, Surface chemistry of materials deposition at atomic layer level, Applied Surface Science 100/101, pp. 391-398, Elsevier 1996.
  • US Patent 6,015,590, (1994/2000) T Suntola, S Lindfors, Method for growing thin films.
  • Tuomo Suntola, Atomic Layer Epitaxy, Handbook of Crystal Growth Vol. 3, Thin Films and Epitaxy, Edited by D.T.J. Hurle, Chapter 14, pp. 605-661, Elsevier Science B.V., 1994.
  • US Patent 5,711,811, (1994/1998) T Suntola, S Lindfors, P Soininen, Method and equipment for growing thin films.
  • T. Suntola, Cost-effective processing by atomic layer epitaxy, Thin Solid Films 225, pp. 96-98, Elsevier 1993.
  • T. Suntola, Atomic Layer Epitaxy, Review article, Thin Solid Films, Volume 216, Issue 1, 28 August 1992, pp. 84-89, Elsevier.
  • T. Suntola, Atomic Layer Epitaxy, Review article, Materials Science Reports, Vol 4, Number 7, December 1989, pp. 261-312, Elsevier.
  • T. Suntola, J. Hyvärinen, Atomic Layer Epitaxy, Annual review of materials science, Vol 15, pp.177-95, 1985.
  • US Patent 4,389,973 (1979/1983), TS Suntola, AJ Pakkala, SG Lindfors, Apparatus for performing growth of compound thin films.
  • US Patent 4,413,022 (1979/1983), TS Suntola, AJ Pakkala, SG Lindfors, A Method for performing growth of compound thin films by alternately repeating separate surface reactions of the substances comprising the compound.
  • US Patent 4,058,430 (1974/1977) Suntola, Antson, Method for producing compound thin films.

Books and Review Articles

(Most recent at the top) 

  • R. L. Puurunen, H. Kattelus, T. Suntola, "Atomic layer deposition in MEMS technology", Ch. 26 of Handbook of Silicon Based MEMS Materials and Technologies, Ed. V. Lindroos et al. , pp. 433-446, Elsevier, 2010. 
  • S. Haukka, E.-L. Lakomaa, T. Suntola, "Adsorption controlled preparation of heterogeneous catalysts", Adsorption and its Applications in Industry and Environmental Protection, A.Dabrowski, ed, Elsevier Science Publishers B.V.,1998.
  • T. Suntola, "Atomic Layer Epitaxy", Handbook of Crystal Growth 3, Thin Films and Epitaxy, Part B: Growth Mechanisms and Dynamics, Chapter 14, Elsevier Science Publishers B.V., 1994.
  • T. Suntola, "Atomic Layer Epitaxy", Handbook of Thin Film Process Technology, Institute of Physics (IOP) Publishing Inc., 1994.
  • T. Suntola, M. Simpson, "Atomic Layer Epitaxy", Blackie, Chapman &Hall, ISBN 0-412-02011-4, 1990
  • T. Suntola, "Atomic Layer Epitaxy", Materials Science Reports, Volume 4, number 7, December 1989, 0920-2307/89, Elsevier Science Publishers B.V.

Recent Presentations on the ALD Technology

Millenium Technology Prize 2018

T. Suntola, Atomic Layer Deposition, Public presentation at Aalto University, May 23, 2018. Download presentation

From the Basics to Industrial Applications

T. Suntola, From the Basics to Industrial Applications, Opening Symposium of Global Innovation Center, Kyushu University – Friday, April 7th, 2017. 



Material Buildup by Atomic Layers

T. Suntola (Invited) ALD – Material Buildup by Atomic Layers, 5th International Workshop on Applications of Nanoscience and Nanotechnology (IWANN-5), Bilkent University - UNAM, Ankara 15-26 June 2015. 

From ideas to global industry

T. Suntola (Invited) From ideas to global industry, BALTIC ALD, University of Helsinki, May 12-13, 2014.
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Selected Presentations on Atomic Layer Deposition

  • T. Suntola, (Invited) "Invention of ALD and protection of knowledge", ENHANCE - Winter-School 9-12 January 2012, University of Helsinki Presentation, ppsx
  • T. Suntola (Invited) Atomic Layer Deposition, The 3rd International Nanotechnology Conference & Exhibition, Tel-Aviv, Israel, March 26-27, 2012.
  • T. Suntola (Invited) ALD Challenges in Photovoltaics, 95th Canadian Chemistry Conference and Exhibition, Calgary, Alberta, May 26-30, 2012. 
  • T. Suntola (Invited) ALD, Past, Present and Future, SEMATECH Thermal Equipment Forum, Albany, NY, April 13, 2011. 
  • T. Suntola (Invited) ALD for advanced semiconductor and nanotechnology manufacturing, The 1st China ALD scientific meeting, Shanghai, 18 – 19 October 2010. 
  • T. Suntola (Invited) ALD for advanced semiconductor and nanotechnology manufacturing, Russian-Finnish Scientific Conference, Helsinki, 12 – 13 September 2007. 
  • T. Suntola (Invited) 30 years of ALD, ALD 2004 Conference, University of Helsinki, 2004. 
  • T. Suntola (Invited) Atomic Layer CVD for Semiconductor Processing, Shanghai Conference on Next Generation Materials and Devices for Si-based Microelectronics, 1999. 
  • T. Suntola (Invited) Atomically controlled growth of thin films and molecular structures, Kyoto ALE Workshop, KRI ICC ’97, Kyoto, Japan, 1997. 
  • T. Suntola (Invited) Control of Thin Film Growth at Atomic Layer Level, the 5th Chemical Congress of North America in Cancun, Mexico, November 11-15, 1997. 
  • T. Suntola Atomic Layer Epitaxy, SID Display Works, San Jose, Jan 1996. 
  • T. Suntola Atomic Layer Epitaxy for High Volume FPD Manufacturing, SID, Display Manufacturing Technology Conference, Santa Clara, CA, January 31 – February 2, 1995. 
  • T. Suntola Surface Chemistry of Materials Deposition at Atomic Layer Level, 9th International Conference of Solid Surfaces, Yokohama, September 25 – 29, 1995. 
  • T. Suntola (Invited) Recent Development of Atomic Layer Epitaxy, 4th European Vacuum Conference June 13-17, 1994, Uppsala, Sweden 1994. 
  • T. Suntola (Invited) Productional Capabilities of Atomic Layer Epitaxy, 3rd International Symposium on Atomic Layer Epitaxy and Related Surface Processes, Sendai, Japan, May 25-27, 1994. 
  • T. Suntola (Invited) Productional capabilities of Atomic Layer Epitaxy, The Japan Society of Applied Physics, Tokyo, Japan, May 30, 1994. 
  • T. Suntola (Session opening talk) Atomic Layer Epitaxy in Semiconductor Devices Applications, MRS Fall Meeting & Exhibit, Boston 1994. 
  • T. Suntola (Invited), The Growth Mechanism of Atomic Layer Epitaxy, IUMRS-ICAM-1993, Tokyo, Japan 1993 
  • T. Suntola (Invited) Cost effective processing by ALE, 2nd International Symposium on Atomic Layer Epitaxy, Raleigh, North Carolina, USA, June 2 – 5, 1992. 
  • T. Suntola, Atomic Layer Epitaxy, ISSCG-8, Palm Springs, CA, August 9 – 14, 1992. 
  • T. Suntola (Invited) Atomic Layer Epitaxy, International Workshop on Science and Technology of Thin Films for the 21st Century, Evanston, IL, USA, July 28 – August 2, 1991. 
  • T. Suntola (Invited) Development Challenges of Atomic Layer Epitaxy, (Invited) 1st International Conference on Atomic Layer Epitaxy, Espoo 1990. 
  • T. Suntola (Invited) Atomic Layer Epitaxy, First Symposium on Atomic Layer Epitaxy, VTT Symposium 54, Espoo 1984.
  • T. Suntola (Invited) Atomic Layer Epitaxy, 16th, 1984 International Conference on Solid State Devices and Materials, Kobe, Japan, 1984 / Proc. of the 16th Int. Conf. on Solid State Devices and Materials, Kobe, p. 647, 1984. 
  • T. Suntola (Invited) Atomic Layer Epitaxy, 1981 5th International Conference on Vapor Growth and Epitaxy, San Diego, USA, 1981 / Tech. Digest of ICVGE-5, San Diego, 1981. 
  • T. Suntola, J. Antson, A Pakkala, S. Lindfors Thin Film Electroluminescent Device, SID 1980 conference, San Diego, USA / SID 80 Digest, p. 108, 1980.
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