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Atomic Layer Deposition ​


Recent reviews on the ALD technology ​

Riikka Puurunen, A Short History of Atomic Layer Deposition: Tuomo Suntola’s Atomic Layer Epitaxy, Chemical Vapor Deposition, Vol 20, Issue 10-11-12, Wiley Online Library

40 years of ALD in Finland - Photos, Stories, Exhibition by the Finnish Centre of Excellence in Atomic Layer Deposition

ALD in Wikipedia

Most cited patents and publications on Atomic Layer Deposition (Atomic Layer Epitaxy) ​

(Most recent at the top)

  • US Patent 6,572,705, 2003, T Suntola, S Lindfors, Method and apparatus for growing thin films.
  • T Suntola, Surface chemistry of materials deposition at atomic layer level, Applied Surface Science 100/101, pp. 391-398, Elsevier 1996.
  • US Patent 6,015,590, (1994/2000) T Suntola, S Lindfors, Method for growing thin films.
  • Tuomo Suntola, Atomic Layer Epitaxy, Handbook of Crystal Growth Vol. 3, Thin Films and Epitaxy, Edited by D.T.J. Hurle, Chapter 14, pp. 605-661, Elsevier Science B.V., 1994.
  • US Patent 5,711,811, (1994/1998) T Suntola, S Lindfors, P Soininen, Method and equipment for growing thin films.
  • T. Suntola, Cost-effective processing by atomic layer epitaxy, Thin Solid Films 225, pp. 96-98, Elsevier 1993.
  • T. Suntola, Atomic Layer Epitaxy, Review article, Thin Solid Films, Volume 216, Issue 1, 28 August 1992, pp. 84-89, Elsevier.
  • T. Suntola, Atomic Layer Epitaxy, Review article, Materials Science Reports, Vol 4, Number 7, December 1989, pp. 261-312, Elsevier.
  • T. Suntola, J. Hyvärinen, Atomic Layer Epitaxy, Annual review of materials science, Vol 15, pp.177-95, 1985.
  • US Patent 4,389,973 (1979/1983), TS Suntola, AJ Pakkala, SG Lindfors, Apparatus for performing growth of compound thin films.
  • US Patent 4,413,022 (1979/1983), TS Suntola, AJ Pakkala, SG Lindfors, A Method for performing growth of compound thin films by alternately repeating separate surface reactions of the substances comprising the compound.
  • US Patent 4,058,430 (1974/1977) Suntola, Antson, Method for producing compound thin films.

Books and review articles ​

(Most recent at the top)

  • R. L. Puurunen, H. Kattelus, T. Suntola, "Atomic layer deposition in MEMS technology", Ch. 26 of Handbook of Silicon Based MEMS Materials and Technologies, Ed. V. Lindroos et al. , pp. 433-446, Elsevier, 2010.
  • S. Haukka, E.-L. Lakomaa, T. Suntola, "Adsorption controlled preparation of heterogeneous catalysts", Adsorption and its Applications in Industry and Environmental Protection, A.Dabrowski, ed, Elsevier Science Publishers B.V.,1998.
  • T. Suntola, "Atomic Layer Epitaxy", Handbook of Crystal Growth 3, Thin Films and Epitaxy, Part B: Growth Mechanisms and Dynamics, Chapter 14, Elsevier Science Publishers B.V., 1994.
  • T. Suntola, "Atomic Layer Epitaxy", Handbook of Thin Film Process Technology, Institute of Physics (IOP) Publishing Inc., 1994.
  • T. Suntola, M. Simpson, "Atomic Layer Epitaxy", Blackie, Chapman &Hall, ISBN 0-412-02011-4, 1990
  • T. Suntola, "Atomic Layer Epitaxy", Materials Science Reports, Volume 4, number 7, December 1989, 0920-2307/89, Elsevier Science Publishers B.V.

Recent presentations on the ALD technology ​

Millenium Technology Prize 2018 ​

T. Suntola, Atomic Layer Deposition, Public presentation at Aalto University, May 23, 2018. Download presentation

From the basics to industrial applications ​

T. Suntola, From the Basics to Industrial Applications, Opening Symposium of Global Innovation Center, Kyushu University – Friday, April 7th, 2017. Download presentation

Material buildup by atomic layers ​

T. Suntola (Invited) ALD – Material Buildup by Atomic Layers, 5th International Workshop on Applications of Nanoscience and Nanotechnology (IWANN-5), Bilkent University - UNAM, Ankara 15-26 June 2015. Download presentation

From ideas to global industry ​

T. Suntola (Invited) From ideas to global industry, BALTIC ALD, University of Helsinki, May 12-13, 2014. Download presentation MISSING LINK

Selected presentations on Atomic Layer Deposition ​

  • T. Suntola, (Invited) "Invention of ALD and protection of knowledge", ENHANCE - Winter-School 9-12 January 2012, University of Helsinki Presentation, ppsx
  • T. Suntola (Invited) Atomic Layer Deposition, The 3rd International Nanotechnology Conference & Exhibition, Tel-Aviv, Israel, March 26-27, 2012.
  • T. Suntola (Invited) ALD Challenges in Photovoltaics, 95th Canadian Chemistry Conference and Exhibition, Calgary, Alberta, May 26-30, 2012.
  • T. Suntola (Invited) ALD, Past, Present and Future, SEMATECH Thermal Equipment Forum, Albany, NY, April 13, 2011.
  • T. Suntola (Invited) ALD for advanced semiconductor and nanotechnology manufacturing, The 1st China ALD scientific meeting, Shanghai, 18 – 19 October 2010.
  • T. Suntola (Invited) ALD for advanced semiconductor and nanotechnology manufacturing, Russian-Finnish Scientific Conference, Helsinki, 12 – 13 September 2007.
  • T. Suntola (Invited) 30 years of ALD, ALD 2004 Conference, University of Helsinki, 2004.
  • T. Suntola (Invited) Atomic Layer CVD for Semiconductor Processing, Shanghai Conference on Next Generation Materials and Devices for Si-based Microelectronics, 1999.
  • T. Suntola (Invited) Atomically controlled growth of thin films and molecular structures, Kyoto ALE Workshop, KRI ICC ’97, Kyoto, Japan, 1997.
  • T. Suntola (Invited) Control of Thin Film Growth at Atomic Layer Level, the 5th Chemical Congress of North America in Cancun, Mexico, November 11-15, 1997.
  • T. Suntola Atomic Layer Epitaxy, SID Display Works, San Jose, Jan 1996.
  • T. Suntola Atomic Layer Epitaxy for High Volume FPD Manufacturing, SID, Display Manufacturing Technology Conference, Santa Clara, CA, January 31 – February 2, 1995.
  • T. Suntola Surface Chemistry of Materials Deposition at Atomic Layer Level, 9th International Conference of Solid Surfaces, Yokohama, September 25 – 29, 1995.
  • T. Suntola (Invited) Recent Development of Atomic Layer Epitaxy, 4th European Vacuum Conference June 13-17, 1994, Uppsala, Sweden 1994.
  • T. Suntola (Invited) Productional Capabilities of Atomic Layer Epitaxy, 3rd International Symposium on Atomic Layer Epitaxy and Related Surface Processes, Sendai, Japan, May 25-27, 1994.
  • T. Suntola (Invited) Productional capabilities of Atomic Layer Epitaxy, The Japan Society of Applied Physics, Tokyo, Japan, May 30, 1994.
  • T. Suntola (Session opening talk) Atomic Layer Epitaxy in Semiconductor Devices Applications, MRS Fall Meeting & Exhibit, Boston 1994.
  • T. Suntola (Invited), The Growth Mechanism of Atomic Layer Epitaxy, IUMRS-ICAM-1993, Tokyo, Japan 1993
  • T. Suntola (Invited) Cost effective processing by ALE, 2nd International Symposium on Atomic Layer Epitaxy, Raleigh, North Carolina, USA, June 2 – 5, 1992.
  • T. Suntola, Atomic Layer Epitaxy, ISSCG-8, Palm Springs, CA, August 9 – 14, 1992.
  • T. Suntola (Invited) Atomic Layer Epitaxy, International Workshop on Science and Technology of Thin Films for the 21st Century, Evanston, IL, USA, July 28 – August 2, 1991.
  • T. Suntola (Invited) Development Challenges of Atomic Layer Epitaxy, (Invited) 1st International Conference on Atomic Layer Epitaxy, Espoo 1990.
  • T. Suntola (Invited) Atomic Layer Epitaxy, First Symposium on Atomic Layer Epitaxy, VTT Symposium 54, Espoo 1984.
  • T. Suntola (Invited) Atomic Layer Epitaxy, 16th, 1984 International Conference on Solid State Devices and Materials, Kobe, Japan, 1984 / Proc. of the 16th Int. Conf. on Solid State Devices and Materials, Kobe, p. 647, 1984.
  • T. Suntola (Invited) Atomic Layer Epitaxy, 1981 5th International Conference on Vapor Growth and Epitaxy, San Diego, USA, 1981 / Tech. Digest of ICVGE-5, San Diego, 1981.
  • T. Suntola, J. Antson, A Pakkala, S. Lindfors Thin Film Electroluminescent Device, SID 1980 conference, San Diego, USA / SID 80 Digest, p. 108, 1980.

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