Tuomo Suntola       In Finnish, suomeksi

PhD 

Tuomo Suntola

PhD in electron physics (1971)

Atomic Layer Deposition (ALD)

Atomic Layer Deposition (ALD) is a method of material layer buildup one atomic layer at time. ALD is an enabling technology for modern semiconductor devices and an important technology in many other applications ranging from solar cells and Li-batteries to silver ornaments and telescope mirrors.

Renewable Energies,

Scenarios on future energy solutions. Analysis of the effect of acidizing pollutants on the CObalance of the atmosphere.

Fundamentals of Physics, 

The Dynamic Universe (DU) theory is a holistic description of the observable physical reality. DU relies on absolute time and distance as coordinate quantities essential for human comprehension and shows relativity in terms of local energy states.

Biography

Tuomo Suntola graduated MSc (1967) and PhD (1971) in Electron Physics in the Electrical Engineering Department at Helsinki University of Technology. He entered to materials sciences and thin film technologies by solving the late 60’s mystery of the nanosecond switching mechanism in “Ovonic” thin film devices as his doctoral dissertation. His first industrial work was “Humicap®” thin film humidity sensor for Vaisala Oy (1973) which still, almost 40 years later holds the world market leader’s position in humidity sensing. He was invited to Instrumentarium Oy where he in 1974 introduced the Atomic Layer Epitaxy (ALE) process which after development for productional capability in became the leading technology for electroluminescent flat panel displays. After further development at Microchemistry Ltd the ALE technology and machinery reached the requirements for advanced semiconductor processing. Renamed as Atomic Layer Deposition (ALD) the technology has merged into IC manufacturing, enabling extreme conformality and controlled processing of ultra-thin material layers of a few atomic layers. Suntola’s technologist’s career produced many important patents, vital industrial applications, and scientific papers. His technological impact was complemented by work on photovoltaic devices and insightful analyses of global energy challenges.

“Considerations of the philosophy of science and the foundations of physics have been a source of inspiration throughout my career, both in technological developments and the search of a holistic view of physical reality".

EDUCATION, EMPLOYMENTS 

Helsinki University of Technology, Electrical Engineering Department / Electron physics laboratory 
    M.Sc. (1967), Ph.D. (1971) 
State Research Centre, VTT, Scientist (1968-1973)
    Development of Humicap humidity sensor for Vaisala Oy (1971-1973) 
Instrumentarium Oy, Chief Scientist (1974-1978)
    Development of Atomic Layer Epitaxy, ALE (Atomic Layer Deposition, ALD) for manufacturing of electroluminescent thin film displays.
Lohja Corporation, Director of Display Division/Chief Scientist (1978-1987)
    Development of Atomic Layer Epitaxy, ALE (Atomic Layer Deposition, ALD) for manufacturing of electroluminescent thin film displays
Microchemistry Ltd, subsidiary of Neste/Fortum Corporation, Managing director (1987-1997)
    Development of solar cell technologies
    Extension of the use of Atomic Layer Deposition to the manufacturing of heterogeneous catalysts
    Development of the ALD technology and equipment for semiconductor applications 
Fortum Corporation, R&D Fellow, (1997-2004)
    Renewablele energy technologies, retired 2004


NOMINATIONS, MEMBERSHIPS 

Docent at Physics Department of Tampere University of Technology, 1975 -, Lectures on semiconductor physics (1972-78)
Member of the Finnish Academy of Technology, TTA, 1983 - / Board member 1988-93. 
Member in the World Energy Council (WEC), Working group "Energy Technologies for the 21st century" 2003-2004
Board member, Picosun Oy, 2004 - 
Chairman of the Finnish Society for Natural Philosophy, 2015 - 2017 (board member 2007-2010, 2014)
Chairman of the Physics Foundations Society, 2008 -


HONORS AND AWARDS 



PATENTS

US patents with Suntola as the main inventor. All patents in the list are issued worldwide.
Data: The original application date (foreign patent priority in the US)/filed in the US, US patent number, Inventors, Title with link to the United States Patent Office Data Base.
See also Espacenet, European Patent office

1972-11-12/1979-08-21, US 4,164,868 Suntola, Capacitive humidity transducer 
1974-11-29/1977-11-15, US 4,058,430 Suntola, Antson, Method for producing compound thin films 
1979-02-28/1983-11-01, US 4,413,022 Suntola, Pakkala, Lindfors, Method for performing growth of compound thin films 
1980-08-20/1983-06-14, US 4,388,554 Suntola, Antson, Electroluminescent display component 
1980-04-24/1983-08-02, US 4,396,864 Suntola et al., Electroluminescent display component 
1981-12-11/1983-06-28, US 4,389,973 Suntola, Pakkala, Lindfors, Apparatus for performing growth of compound thin films 
1985-03-05/1990-03-13, US 4,907,862 Suntola, Method for generating electronically controllable color elements and color display based on the method 
1990-01-16/2003-03-18, US 6,534,431 Suntola et al., Process and apparatus for preparing heterogeneous catalysts 
1991-07-16/2002-12-31, US 6,500,780 Suntola et al., Method for preparing heterogeneous catalysts of desired metal content 
1994-11-28/1998-01-27, US 5,711,811 Suntola, Lindfors, Soininen, Method and equipment for growing thin films 
1994-11-28/2000-01-18, US 6,015,590 Suntola, Lindfors, Method for growing thin films 
1994-11-28/2003-07-03, US 6,572,705 Suntola, Lindfors, Method and apparatus for growing thin films 
1994-11-28/2008-07-29, US 7,404,984 Suntola, Lindfors, Method for growing thin films 
1994-11-28/2009-03-03, US 7,498,059 Suntola, Lindfors, Method for growing thin films 
1997-07-04/2003-10-07, US 6,630,030 Suntola, Soininen, Bondestam, Method and apparatus for growing thin films
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